Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces

利用全介质超表面生成高均匀性和高分辨率的贝塞尔光束阵列

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Abstract

Bessel beam arrays are progressively attracting attention in recent years due to their remarkable non-diffracting nature and parallel manipulation capabilities in diverse applications. However, the poor phase discretization of conventional approaches such as spatial light modulators leads to low numerical aperture (NA) beam arrays due to the limitation imposed by the Nyquist sampling theorem and poor uniformity of the beam intensity. The key contribution of this study is to experimentally demonstrate the generation of high-uniformity and high-resolution Bessel beam arrays by utilizing all-dielectric metasurfaces. This is attained by optimizing the design of the supercell of a Dammann grating, particularly decreasing each supercell of the grating to a proper size. We demonstrate a 4 × 4 array of Bessel beams with a subwavelength transverse dimension (570 nm, ∼0.9λ) and a large NA of 0.4 for each beam in the array, while maintaining a relatively high uniformity intensity (52.40%) for the array. Additionally, the Bessel beam arrays are generated in a broadband range through the proposed all-dielectric metasurfaces. Our results are of great significance and particularly useful for applications of metasurface-based Bessel beam arrays in multidisciplinary fields such as laser fabrication, biomedical imaging, data storage, and multi-particle trapping.

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