Post-thermal-Induced Recrystallization in GaAs/Al(0.3)Ga(0.7)As Quantum Dots Grown by Droplet Epitaxy with Near-Unity Stoichiometry

采用液滴外延法生长的近乎1:1化学计量比GaAs/Al(0.3)Ga(0.7)As量子点中热诱导后重结晶现象

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Abstract

Here, we investigate the stoichiometry control of GaAs/Al(0.3)Ga(0.7)As droplet epitaxy (DE) quantum dots (QDs). Few tens of core nonstoichiometries in the Ga(As) atomic percent are revealed in as-grown "strain-free" QDs using state-of-the-art atomic-scale energy-dispersive X-ray spectroscopy based on transmission electron microscopy. Precise systematic analyses demonstrate a successful quenching of the nonstoichiometry below 2%. The control of the chemical reactions with well-controlled ex situ annealing sheds light on the engineering of a novel single-photon source of strain-free DE QDs free of defects.

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