Abstract
A novel low-cost, batch-fabrication method combining the spin-coating nanosphere lithography (NSL) with the conventional photolithographic technique is demonstrated to efficiently produce the metallic planar microlenses and their arrays. The developed microlenses are composed of subwavelength nanoholes and can focus light effectively in the entire visible spectrum, with the foci sizes close to the Rayleigh diffraction limit. By changing the spacing and diameter of nanoholes, the focusing efficiency can be tuned. Although the random defects commonly exist during the self-assembly of nanospheres, the main focusing performance, e.g., focal length, depth of focus (DOF), and full-width at half-maximum (FWHM), keeps almost invariable. This research provides a cheap way to realize the integrated nanophotonic devices on the wafer level.