Developments of Interfacial Measurement Using Cavity Scanning Microwave Microscopy

利用腔扫描微波显微镜进行界面测量的发展

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Abstract

In the field of materials research, scanning microwave microscopy imaging has already become a vital research tool due to its high sensitivity and nondestructive testing of samples. In this article, we review the main theoretical and fundamental components of microwave imaging, in addition to the wide range of applications of microwave imaging. Rather than the indirect determination of material properties by measuring dielectric constants and conductivity, microwave microscopy now permits the direct investigation of semiconductor devices, electromagnetic fields, and ferroelectric domains. This paper reviews recent advances in scanning microwave microscopy in the areas of resolution and operating frequency and presents a discussion of possible future industrial and academic applications.

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