Substrate Interference and Strain in the Second-Harmonic Generation from MoSe(2) Monolayers

MoSe(2)单层二次谐波产生中的衬底干涉和应变

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Abstract

Nonlinear optical materials of atomic thickness, such as non-centrosymmetric 2H transition metal dichalcogenide monolayers, have a second-order nonlinear susceptibility (χ((2))) whose intensity can be tuned by strain. However, whether χ((2)) is enhanced or reduced by tensile strain is a subject of conflicting reports. Here, we grow high-quality MoSe(2) monolayers under controlled biaxial strain created by two different substrates and study their linear and nonlinear optical responses with a combination of experimental and theoretical approaches. Up to a 15-fold overall enhancement in second-harmonic generation (SHG) intensity is observed from MoSe(2) monolayers grown on SiO(2) when compared to its value on a Si(3)N(4) substrate. By considering an interference contribution from different dielectrics and their thicknesses, a factor of 2 enhancement of χ((2)) was attributed to the biaxial strain: substrate interference and strain are independent handles to engineer the SHG strength of non-centrosymmetric 2D materials.

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