Abstract
A simple and effective strategy for introducing sulfur into a polymethacrylate matrix at room temperature has been developed, allowing for the polymerization of a variety of methacrylate derivatives with sulfur. The resulting S-containing polymers exhibited a high refractive index of up to 1.72 while retaining over 90% transmittance in the visible region. Additionally, when mixed with 3% photo acid generator (PAG) as photoresist, the formulation demonstrated excellent patterning capabilities. Furthermore, the scalable preparation of high-refractive-index polymers (HRIPs) indicates significant potential for fabrication.