Effect of Nitrogen Partial Pressure on Structure, Mechanical Property, and Corrosion Behavior of ZrN(x) Films Prepared by Reactive DC Magnetron Sputtering

氮气分压对反应直流磁控溅射法制备的ZrN(x)薄膜的结构、力学性能和腐蚀行为的影响

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Abstract

ZrN(x) films were deposited by DC magnetron sputtering with pure Zr target in different nitrogen partial pressure atmospheres (r = N(2)/[Ar + N(2)]). The structure and composition of the thin films were characterized as a function of r using scanning electron microscope, glancing angle X-ray diffraction, and X-ray photoelectron spectroscopy. The hardness, adhesive strength, and corrosion behavior of the coatings were measured by nanoindentation, microscratch, and potentiodynamic measurements in 3.5 wt% NaCl solution. The results show that the structure of the ZrN(x) films changes from a nearly stoichiometric ZrN with a typical columnar structure to mixed phases composited of ZrN and α-ZrN(x) with a dense glass structure as r increases from 12% to 50%. The mechanical properties including hardness, elastic modulus, and adhesion decrease with increasing r due to nonstoichiometric compound and glass phase structure of the coatings, while the dense glass structure significantly improves the corrosion inhibition.

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