TiO2 Coatings Via Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition for Enhancing the UV-Resistant Properties of Transparent Plastics

通过大气压等离子体增强化学气相沉积制备 TiO2 涂层以增强透明塑料的抗紫外线性能

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作者:Jing Xu, Hiroki Nagasawa, Masakoto Kanezashi, Toshinori Tsuru

Abstract

Herein, TiO2 coatings were deposited on photodegradable polymers for protection from UV irradiation using the atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) technique. Polymethylmethacrylate (PMMA) and polycarbonate (PC) substrates were coated with titanium tetraisopropoxide as the precursor in an open-air atmospheric-pressure nonequilibrium argon plasma jet. The AP-PECVD-derived TiO2 coatings exhibited good adhesion to PMMA and PC. The TiO2 coatings could shield more than 99% of UV light in the wavelength range of 200-300 nm, without affecting the transmittance of visible light. UV irradiation tests on polymer films demonstrated that the degradation rates of PMMA and PC were significantly reduced by one-tenth after they were coated with TiO2 films.

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