The investigation of selective pre-pattern free self-assembled Ge nano-dot formed by excimer laser annealing

利用准分子激光退火技术研究选择性预图案无自组装锗纳米点

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Abstract

Localized Ge nano-dot formation by laser treatment was investigated and discussed in terms of strain distribution. The advantage of this technique is patterning localization of nano-dots without selective epitaxial growth, reducing costs and improving throughput. Self-assembled Ge nano-dots produced by excimer laser annealing statistically distributed dot density and size dependent on laser energy. Improvement in the crystallization quality of the dots was also studied, and a strain analysis was undertaken.

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