Emission properties of Ga(2)O(3) nano-flakes: effect of excitation density

Ga₂O₃纳米片的发射特性:激发密度的影响

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Abstract

In the quest of developing high performance electronic and optical devices and more cost effective fabrication processes of monoclinic β-Ga(2)O(3), new growth techniques and fundamental electronic and optical properties of defects have to be explored. By heating of dissolved metallic Ga in HCl in a NH(3) and N(2) atmosphere, nano-flake films of monoclinic β-phase Ga(2)O(3) were grown as confirmed by XRD. From optical measurements, we observe two strong emissions. A red band peaking at ~2.0 eV and a UV band at ~3.8 eV. The band at ~2.0 eV is attributed to donor-acceptor pair recombination where the donor and acceptor level is suggested to be related to V(O) and nitrogen, respectively. By studying the dependence of the intensity of the UV band at 3.8 eV versus excitation density, a model is suggested. In the model, it is assumed that local potential fluctuations forming minima (maxima), where the carriers would be localized with a summarized band offset for conduction and valence band of 1 eV. The origin of the fluctuations is tentatively suggested to be related to micro-inclusions of different phases in the film.

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