The pH Sensing Properties of RF Sputtered RuO(2) Thin-Film Prepared Using Different Ar/O(2) Flow Ratio

采用不同Ar/O₂流量比制备的射频溅射RuO₂薄膜的pH传感性能

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Abstract

The influence of the Ar/O(2) gas ratio during radio frequency (RF) sputtering of the RuO(2) sensing electrode on the pH sensing performance is investigated. The developed pH sensor consists in an RF sputtered ruthenium oxide thin-film sensing electrode, in conjunction with an electroplated Ag/AgCl reference electrode. The performance and characterization of the developed pH sensors in terms of sensitivity, response time, stability, reversibility, and hysteresis are investigated. Experimental results show that the pH sensor exhibits super-Nernstian slopes in the range of 64.33–73.83 mV/pH for Ar/O(2) gas ratio between 10/0–7/3. In particular, the best pH sensing performance, in terms of sensitivity, response time, reversibility and hysteresis, is achieved when the Ar/O(2) gas ratio is 8/2, at which a high sensitivity, a low hysteresis and a short response time are attained simultaneously.

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