Improvement of mask R-CNN and deep learning for defect detection and segmentation in electronic products

改进掩模R-CNN和深度学习在电子产品缺陷检测和分割中的应用

阅读:1

Abstract

With the rapid development of industrial automation and intelligent manufacturing, defect detection of electronic products has become crucial in the production process. Traditional defect detection methods often face the problems of insufficient accuracy and inefficiency when dealing with complex backgrounds, tiny defects, and multiple defect types. To overcome these problems, this paper proposes Y-MaskNet, a multi-task joint learning framework based on YOLOv5 and Mask R-CNN, which aims to improve the accuracy and efficiency of defect detection and segmentation in electronic products. Y-MaskNet combines the high efficiency of YOLOv5 in target detection with the fine segmentation capability of Mask R-CNN and optimizes the overall performance of the model through a multi-task learning framework. Experimental results show that Y-MaskNet achieves a significant improvement in detection and segmentation tasks, with mAP@[0.5:0.95] reaching 0.72 (up from 0.62 for YOLOv5 and 0.65 for Mask R-CNN) on the PCB Defect Dataset, and IoU improving by 7% compared to existing methods. These improvements are particularly notable in small object detection and fine-grained defect segmentation, making Y-MaskNet an efficient and accurate solution for defect detection in electronic products, offering strong technical support for future industrial intelligent quality control.

特别声明

1、本页面内容包含部分的内容是基于公开信息的合理引用;引用内容仅为补充信息,不代表本站立场。

2、若认为本页面引用内容涉及侵权,请及时与本站联系,我们将第一时间处理。

3、其他媒体/个人如需使用本页面原创内容,需注明“来源:[生知库]”并获得授权;使用引用内容的,需自行联系原作者获得许可。

4、投稿及合作请联系:info@biocloudy.com。