Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution

利用介质阻挡放电冷大气等离子体和等离子体处理溶液增强植物嫁接技术

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Abstract

A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of Pyrus communis L. by 35-44%, and the diameter of the root collar by 10-28%. In this case, the electrical resistivity of the graft decreased by 20-48%, which indicated the formation of a more developed vascular system at the rootstock-scion interface. The characteristics of DBD CAP and PTS are described in detail.

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