Abstract
Metallic nanostructures have widespread applications in fields including materials science, electronics and catalysis. Mesoporous silica films synthesised by evaporation induced self-assembly and electrochemically assisted self-assembly with pores below 10 nm were used as hard templates for the electrodeposition of Au nanostructures. Electrodeposition conditions were optimised based on pore orientation and size. The growth of nanostructures was initiated at the electrode surface as confirmed by microscopy. The hard templates and Au electrodeposits were characterised electrochemically as well as with X-ray diffraction, small angle scattering and transmission electron microscopy. Finally, mesoporous silica hard templates were removed by hydrofluoric acid etching and stable Au nanoparticles on different electrode surfaces were achieved.