Abstract
It is shown that the integration of a single-photon avalanche diode (SPAD) together with a BiCMOS gating circuit on one chip reduces the parasitic capacitance a lot and therefore reduces the avalanche build-up time. The capacitance of two bondpads, which are necessary for the connection of an SPAD chip and a gating chip, are eliminated by the integration. The gating voltage transients of the SPAD are measured using an integrated mini-pad and a picoprobe. Furthermore, the gating voltage transients of a CMOS gating circuit and of the BiCMOS gating circuit are compared for the same integrated SPAD. The extension of the 0.35 μm CMOS process by an NPN transistor process module enabled the BiCMOS gating circuit. The avalanche build-up time of the SPAD is reduced to 1.6 ns due to the integration compared to about 3 ns for a wire-bonded off-chip SPAD using the same n+ and p-well as well as the same 0.35 μm technology.