Abstract
In this paper, we introduce a differential sensing technique for CMOS capacitive fingerprint detection. It employs a new capacitive-sensing cell structure with charge sharing detection and readout circuit. The proposed technique also can eliminate the effect of parasitic capacitances by employing parasitic insensitive switched-capacitor structure and so increases the sensitivity even under severe noisy conditions. It can also overcome the performance degradation caused by various conditions of finger surface by using a differential integrator and adjusting its number of integrations. In addition, the proposed architecture allows parallel detection of all sensing channels. It can, therefore, substantially speed up the detection process compared with conventional architectures. We implemented a prototype fingerprint sensor chip with an array of 20 × 16 sensor cells using a 130 nm CMOS process. Simulation experiments demonstrated that the proposed architecture provided an SNR gain of 54 dB, whereas a conventional single line sensing gives an SNR gain of only 13 dB.