Abstract
Diamond-copper composites, due to their exceptional thermal conductivity, hold significant potential in the field of electronic device thermal management. Hot-press sintering is a promising fabrication technique with industrial application prospects; however, the thermal conductivity of composites prepared by this method has yet to reach optimal levels. In this study, tungsten was deposited on the surface of diamond particles by magnetron sputtering as an interfacial transition layer, and hot-press sintering was employed to fabricate the composites. The findings reveal that with prolonged annealing time, tungsten gradually transformed into W(2)C and WC, significantly enhancing interfacial bonding strength. When the diamond volume content was 50% and the interfacial coating consisted of 2 wt.% W, 92 wt.% WC, and 6 wt.% W(2)C, the composite exhibited a thermal conductivity of 640 W/(m·K), the highest value reported among hot-press sintered composites with diamond content below 50%. Additionally, the AMM (Acoustic Mismatch Model) and DMM (Diffusion Mismatch Model) models were utilized to calculate the interfacial thermal conductance between different phases, identifying the optimal interfacial structure as diamond/W(2)C/WC/W(2)C/Cu. This composite material shows potential for application in high-power electronic device cooling, thermal management systems, and thermoelectric conversion, providing a more efficient thermal dissipation solution for related devices.