Solution-processed zirconium acetylacetonate charge-trap layer for multi-bit nonvolatile thin-film memory transistors

用于多位非易失性薄膜存储晶体管的溶液法制备的乙酰丙酮锆电荷陷阱层

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Abstract

The charge trap property of solution-processed zirconium acetylacetonate (ZAA) for solution-processed nonvolatile charge-trap memory (CTM) transistors is demonstrated. Increasing the annealing temperature of the ZAA from room temperature (RT) to 300°C in ambient, the carbon double bonds within the ZAA decreases. The RT-dried ZAA for the p-type organic-based CTM shows the widest threshold voltage shift (∆V(TH) ≈ 80 V), four distinct V(THs) for a multi-bit memory operation and retained memory currents for 10(3) s with high memory on- and off-current ratio (I(M,ON)/I(M,OFF) ≈ 5Ⅹ10(4)). The n-type oxide-based CTM (Ox-CTM) also shows a ∆V(TH) of 14 V and retained memory currents for 10(3) s with I(M,ON)/I(M,OFF) ≈ 10(4). The inability of the Ox-CTM to be electrically erasable is well explained with simulated electrical potential contour maps. It is deduced that, irrespective of the varied solution-processed semiconductor used, the RT-dried organic ZAA as CTL shows the best memory functionality in the fabricated CTMs. This implies that the high carbon double bonds in the low-temperature processed ZAA CTL are very useful for low-cost multi-bit CTMs in flexible electronics.

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