Tantalum-doped tin oxide thin films using hollow cathode gas flow sputtering technology
采用空心阴极气体流动溅射技术制备钽掺杂氧化锡薄膜
期刊:Heliyon
影响因子:3.6
doi:10.1016/j.heliyon.2024.e30943
Huo, Fangfang; Muydinov, Ruslan; Seibertz, Bertwin Bilgrim Otto; Wang, Can; Hartig, Manuel; Alktash, Nivin; Gao, Peng; Szyszka, Bernd
