Maskless plasmonic lithography at 22 nm resolution
22纳米分辨率的无掩模等离子体光刻技术
期刊:Scientific Reports
影响因子:3.9
doi:10.1038/srep00175
Pan, Liang; Park, Yongshik; Xiong, Yi; Ulin-Avila, Erick; Wang, Yuan; Zeng, Li; Xiong, Shaomin; Rho, Junsuk; Sun, Cheng; Bogy, David B; Zhang, Xiang