Effect of post-metallization anneal on monolithic co-integration of Hf(0.5)Zr(0.5)O(2)-based FeFET and CMOS
后金属化退火对基于Hf(0.5)Zr(0.5)O(2)的FeFET和CMOS单片集成的影响
期刊:Scientific Reports
影响因子:3.9
doi:10.1038/s41598-025-02281-8
An, Jehyun; Ham, Beomjoo; Hong, Giryun; Park, Jongseo; Kang, Bohyeon; Pyo, Jaeseong; Ahn, Sung-Min; Baek, Rock-Hyun
