Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
利用小分子抑制剂进行区域选择性原子层沉积时,反应表面位点与前驱体选择的关系
期刊:Journal of Physical Chemistry C
影响因子:3.2
doi:10.1021/acs.jpcc.1c10816
Merkx, Marc J M; Angelidis, Athanasios; Mameli, Alfredo; Li, Jun; Lemaire, Paul C; Sharma, Kashish; Hausmann, Dennis M; Kessels, Wilhelmus M M; Sandoval, Tania E; Mackus, Adriaan J M