Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO(2) Using Carbon Dioxide
利用二氧化碳低温等离子体增强原子层沉积法制备SiO₂
期刊:Nanoscale Research Letters
影响因子:
doi:10.1186/s11671-019-2889-y
Zhu, Zhen; Sippola, Perttu; Ylivaara, Oili M E; Modanese, Chiara; Di Sabatino, Marisa; Mizohata, Kenichiro; Merdes, Saoussen; Lipsanen, Harri; Savin, Hele